Atomic Layer Deposition - Ultratech SAVANNAH G2
This ALD system offers an accesible way for atomic layer deposition of metal oxide.
- Sample up to 8-inch diameter
- Precursor available: DI water and TMA (others can be installed upon request)
- Low temperature processing: 180°C max
- Picture in categories
- Cluster 3: Ultra High Vacuum systems for thin film deposition, characterization and batch fabrication