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Université de Bordeaux
ELORPrintTecEquipment of Excellence
Cluster of excellence
 

Atomic Layer Deposition - Ultratech SAVANNAH G2

Atomic Layer Deposition - Ultratech SAVANNAH G2

This ALD system offers an accesible way for atomic layer deposition of metal oxide.

  • Sample up to 8-inch diameter
  • Precursor available: DI water and TMA (others can be installed upon request)
  • Low temperature processing: 180°C max