Facility for Printed Organic Electronics 

PVD System - Plassys MP 900S

PVD System - Plassys MP 900S

This PLASSYS system is designed to perform physical vapor deposition of metal oxide and evaporate metal by E-beam.

  • deposition from 1 to hundreds of nanometers
  • size of the substrate: 100 x 100mm, 15 x 15 mm, can be adapted on request
  • 4 E-beam sources
  • 3 positions of sputtering:
    • 3 target of 3 inch with adjustable tilt
    • 2 target of 2 inch
    • 2 target face to face
  • ion gun for in-situ etching
  • substrate heating up to 800°C
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Cluster 3: Ultra High Vacuum systems for thin film deposition, characterization and batch fabrication


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