Mask alginer / Nano-imprint EVG6200

The EVG6200® mask aligner is a classic photolithography tool that has additional UV nanoimprint and microcontact printing capabilities. With the nanoimprint module, nanostructures with feature sizes much smaller than conventional photolithography can be defined.

• Substrates up to 200 mm in diameter, thickness between 0,1 and 100mm, rigid or flexible.
• Resolution: ? 1.5 µm, nanoimprint: <50 nm
• Assisted alignment: accuracy ±1 µm 3?
• UV radiation: Hg 500W 350-450 nm