Université de Bordeaux
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Atomic Layer Deposition - Ultratech SAVANNAH G2

Atomic Layer Deposition - Ultratech SAVANNAH G2

This ALD system offers an accesible way for atomic layer deposition of metal oxide.

  • Sample up to 8-inch diameter
  • Precursor available: DI water and TMA (others can be installed upon request)
  • Low temperature processing: 180°C max
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Cluster 3: Ultra High Vacuum systems for thin film deposition, characterization and batch fabrication


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