Cluster 1: Advanced instrumentation for top-down and bottom-up processing
This cluster is equipped for solution processing of organic semiconducting materials in the nano- or micro- structured form. Moreover the equipment allows the integration in various device architectures and system configurations.
The Jetlab 4 from Microfab is a single nozzle inkjet printer that can drive upto 4 printheads simultaneously. This tool is used for jetting tests on new ink formulations and the printing of small...
The EVG6200® mask aligner is a classic photolithography tool that has additional UV nanoimprint and microcontact printing capabilities. With the nanoimprint module, nanostructures with feature sizes...
The EVG101® spin- and spraycoater can be used for the preparation of uniform coatings of either active materials or photoresists. Spray coating works with low viscosity materials, using an...
Seven laminar flow hoods are available and equipped for wet chemical processing like deposition, development, wet-etching and lift-off. The integrated U15 filters and automated laminar flow assure...
Reactive Ion Etching Plasma like in this equipment from PlasmaEtch is a dry etching technology using a chemically reactive plasma at low pressure. It presents the advantages of being directional,...