Cluster 3: Ultra High Vacuum systems for thin film deposition, characterization and batch fabrication
The function of this cluster is to obtain a fundamental understanding of organic semiconductors in their purest thin film form, as well as integrated with other materials, organic and/or inorganic. It is also used to fabricate devices by dry batch processes in ultra high vacuum environment and evaluate their performance.
The linear transfer line allows to transport substrates from one deposition or measurement system to the other without breaking the vacuum. It has a pressure in the 10 -9 mbar range.
This Lesker evaporator, housed in a glovebox, is dedicated to metal evaporation. It has 4 thermal as well as 4 e-beam sources. deposition from 1 to hundreds of nanometers size of the substrate: 100...
This Lesker evaporator on glovebox is designed to perform organic and metal evaporation by joule effect deposition from 1 to few hundreds of nanometers size of the substrate: 100 x 100mm², 15 x 15...
This Lesker evaporator on glovebox is designed to perform organic and metal evaporation by E-beam deposition from 1 to few hundreds of nanometers size of the substrate: 100 x 100mm², 15 x 15 mm²,...
This PLASSYS system is designed to perform physical vapor deposition of metal oxide and evaporate metal by E-beam. deposition from 1 to hundreds of nanometers size of the substrate: 100 x 100mm, 15...
This ultra-high vacuum measurement system is equipped with: X-ray source + monochromator X-ray source 2D Electron energy detector UV source Argon sputtering device Electron gun
This Omicron system has AFM as well as STM capabilities integrated in an ultra-high vacuum chamber. AFM : Z - resolution: < 0.01 nm scan range (xyz) : 10 ?m × 10 ?m × 1.5 ?m. STM : tunnelling...
This ALD system offers an accesible way for atomic layer deposition of metal oxide. Sample up to 8-inch diameter Precursor available: DI water and TMA (others can be installed upon request) Low...