Cluster 3: Ultra High Vacuum systems for thin film deposition, characterization and batch fabrication
The function of this cluster is to obtain a fundamental understanding of organic semiconductors in their purest thin film form, as well as integrated with other materials, organic and/or inorganic. It is also used to fabricate devices by dry batch processes in ultra high vacuum environment and evaluate their performance.
![Linear Transfer - SPECS](/images/pixel.gif)
The linear transfer line allows to transport substrates from one deposition or measurement system to the other without breaking the vacuum. It has a pressure in the 10 -9 mbar range.
![Metal Evaporator - Lesker mini Spectros](/images/pixel.gif)
This Lesker evaporator, housed in a glovebox, is dedicated to metal evaporation. It has 4 thermal as well as 4 e-beam sources. deposition from 1 to hundreds of nanometers size of the substrate: 100...
![Organic and Metal Evaporator - Lesker Spectros 101](/images/pixel.gif)
This Lesker evaporator on glovebox is designed to perform organic and metal evaporation by joule effect deposition from 1 to few hundreds of nanometers size of the substrate: 100 x 100mm², 15 x 15...
![Organic and Metal Evaporator - Lesker Spectros 102](/images/pixel.gif)
This Lesker evaporator on glovebox is designed to perform organic and metal evaporation by E-beam deposition from 1 to few hundreds of nanometers size of the substrate: 100 x 100mm², 15 x 15 mm²,...
![PVD System - Plassys MP 900S](/images/pixel.gif)
This PLASSYS system is designed to perform physical vapor deposition of metal oxide and evaporate metal by E-beam. deposition from 1 to hundreds of nanometers size of the substrate: 100 x 100mm, 15...
![XPS / UPS / IPES - SPECS](/images/pixel.gif)
This ultra-high vacuum measurement system is equipped with: X-ray source + monochromator X-ray source 2D Electron energy detector UV source Argon sputtering device Electron gun
![AFM / STM - SCIENTAOMICRON VT AFM XA 50/500](/images/pixel.gif)
This Omicron system has AFM as well as STM capabilities integrated in an ultra-high vacuum chamber. AFM : Z - resolution: < 0.01 nm scan range (xyz) : 10 ?m × 10 ?m × 1.5 ?m. STM : tunnelling...
![Atomic Layer Deposition - Ultratech SAVANNAH G2](/images/pixel.gif)
This ALD system offers an accesible way for atomic layer deposition of metal oxide. Sample up to 8-inch diameter Precursor available: DI water and TMA (others can be installed upon request) Low...