PVD System - Plassys MP 900S

This PLASSYS system is designed to perform physical vapor deposition of metal oxide and evaporate metal by E-beam.

• deposition from 1 to hundreds of nanometers
• size of the substrate: 100 x 100mm, 15 x 15 mm, can be adapted on request
• 4 E-beam sources
• 3 positions of sputtering:
• 3 target of 3 inch with adjustable tilt
• 2 target of 2 inch
• 2 target face to face
• ion gun for in-situ etching
• substrate heating up to 800°C