This Lesker evaporator on glovebox is designed to perform organic and metal evaporation by E-beam deposition from 1 to few hundreds of nanometers size of the substrate: 100 x 100mm², 15 x 15 mm², can be adapted for project uniformity of deposition: <+/- 5% 8 organics sources, co-evaporation possible 4 E-beam sources Substrate heating up to 350°C Possibility to change shadow mask in process
Cluster 3: Ultra High Vacuum systems for thin film deposition, characterization and batch fabricationTuesday 12 July 2016 by SMAAL Willem. Last update Wednesday 20 July 2016This Lesker evaporator on glovebox is designed to perform organic and metal evaporation by joule effect deposition from 1 to few hundreds of nanometers size of the substrate: 100 x 100mm², 15 x 15 mm², can be adapted for project uniformity of deposition: <+/- 5% 8 organics sources, co-evaporation possible 3 thermal sources, co-evaporation possible Substrate cooling and heating from -10°C to...
Cluster 3: Ultra High Vacuum systems for thin film deposition, characterization and batch fabricationTuesday 12 July 2016 by SMAAL Willem. Last update Wednesday 20 July 2016This Shimadzu Fourier Transform Infrared Spectrophotometer is equipped with a Specac ATR unit that allows measurements on thin films and powders. It's also possible to use an external probe to measure directly in solution.
Cluster 2: Synthesis and FormulationTuesday 28 June 2016 by SMAAL Willem. Last update Wednesday 20 July 2016This is a versatile tool to coat an ink or a paste with a pattern in one step. The ink is pushed through either the openings of a metallic mask (stencil), or through a mesh, in the parts where it hasn’t been obstructed by an emulsion (screen). Fully automated alignment, precision ±6.25 µm 3? Substrates and patterns up to 280 mm x 300 mm Compatible with flexible substrates
Cluster 5: Printing PilotsTuesday 28 June 2016 by SMAAL Willem. Last update Tuesday 19 July 2016This solvent purification system dispenses solvents with low (ppm) impurity, water and oxygen levels. The following solvents are available: THF trichloromethane diethylether toluene DMSO
Cluster 2: Synthesis and FormulationTuesday 28 June 2016 by SMAAL Willem. Last update Tuesday 19 July 2016For any kind of question regarding the ELORPrintTec platform, access and technical details, please write an e-mail to: elorprinttec@u-bordeaux.fr
ContactTuesday 28 June 2016 by SMAAL Willem. Last update Tuesday 12 July 2016