The Origin D100 is a table-top inkjet platform that works with industrial printheads. This tool has the accesability of a laboratory tool but allows to work with industrial printheads. substrates upto 330 x 285 x 35 mm, rigid or flexible substrate heating upto 80°C resolution: 0.5um repeatability: +/- 1um x/y precision: 20um
Cluster 5: Printing PilotsTuesday 28 June 2016 by SMAAL Willem. Last update Wednesday 20 July 2016This ultra-high vacuum measurement system is equipped with: X-ray source + monochromator X-ray source 2D Electron energy detector UV source Argon sputtering device Electron gun
Cluster 3: Ultra High Vacuum systems for thin film deposition, characterization and batch fabricationTuesday 28 June 2016 by SMAAL Willem. Last update Wednesday 20 July 2016This Lesker evaporator on glovebox is designed to perform organic and metal evaporation by E-beam deposition from 1 to few hundreds of nanometers size of the substrate: 100 x 100mm², 15 x 15 mm², can be adapted for project uniformity of deposition: <+/- 5% 8 organics sources, co-evaporation possible 4 E-beam sources Substrate heating up to 350°C Possibility to change shadow mask in process
Cluster 3: Ultra High Vacuum systems for thin film deposition, characterization and batch fabricationTuesday 12 July 2016 by SMAAL Willem. Last update Wednesday 20 July 2016This Lesker evaporator on glovebox is designed to perform organic and metal evaporation by joule effect deposition from 1 to few hundreds of nanometers size of the substrate: 100 x 100mm², 15 x 15 mm², can be adapted for project uniformity of deposition: <+/- 5% 8 organics sources, co-evaporation possible 3 thermal sources, co-evaporation possible Substrate cooling and heating from -10°C to...
Cluster 3: Ultra High Vacuum systems for thin film deposition, characterization and batch fabricationTuesday 12 July 2016 by SMAAL Willem. Last update Wednesday 20 July 2016This Shimadzu Fourier Transform Infrared Spectrophotometer is equipped with a Specac ATR unit that allows measurements on thin films and powders. It's also possible to use an external probe to measure directly in solution.
Cluster 2: Synthesis and FormulationTuesday 28 June 2016 by SMAAL Willem. Last update Wednesday 20 July 2016This is a versatile tool to coat an ink or a paste with a pattern in one step. The ink is pushed through either the openings of a metallic mask (stencil), or through a mesh, in the parts where it hasn’t been obstructed by an emulsion (screen). Fully automated alignment, precision ±6.25 µm 3? Substrates and patterns up to 280 mm x 300 mm Compatible with flexible substrates
Cluster 5: Printing PilotsTuesday 28 June 2016 by SMAAL Willem. Last update Tuesday 19 July 2016