This Cascade probestation is installed in a glovebox and is connected to a B1500 semiconductor analyzer. This setup allows you to characterize a large range of electronic components like capacitors, transistors, NAND gates and many more. 150 mm chuck stage 4 micropositioners microscope with 15x - 100x magnification and LED illumination camera with screen measurements down to femtoamp current...

This Newport instrument can measure the internal and external quantum efficiency of photovoltaic devices. Spot size: 1 x 2.5 mm² Spectrum range: 360 -1100 nm Spectral resolution: 10nm

This Hamatsu instrument is designed to measure the quantum yield of photoluminescent materials in the form of powder, thin film or in solution. This instrument is specifically suitable to characterize potential materials for LED applications. measure of the photoluminescence (PL) spectrum measure of the PL yield measure of the chromatic coordinates wavelength range: 300 to 950 nm

This Jeol SEM is designed for surface topology studies in high resolution. A state-of-the-art technology allows to maintain a high resolution, even at low acceleration voltages in order to minimize charging effects and electron beam damage of the sample. Ultra-low acceleration imaging, down to 10V Resolution down to 1nm 5 detectors: LED: secondary electron detector SRBED: backscatter electron...

This Omicron system has AFM as well as STM capabilities integrated in an ultra-high vacuum chamber. AFM : Z - resolution: < 0.01 nm scan range (xyz) : 10 ?m × 10 ?m × 1.5 ?m. STM : tunnelling current: < 1pA - 330 nA scan range (xyz) : 12 ?m × 12 ?m × 1.5 ?m Variable temperature operation in microscope stage : from 80 to 500K.

This PLASSYS system is designed to perform physical vapor deposition of metal oxide and evaporate metal by E-beam. deposition from 1 to hundreds of nanometers size of the substrate: 100 x 100mm, 15 x 15 mm, can be adapted on request 4 E-beam sources 3 positions of sputtering: 3 target of 3 inch with adjustable tilt 2 target of 2 inch 2 target face to face ion gun for in-situ etching substrate...